The North American Chemical Residue Workshop Excellence Award was established in 2015. This annual award will allow NACRW to recognize achievement relevant to the field of chemical residue analysis. In addition, this award will help solidify NACRW as a scientific community with reach beyond the workshop itself. As well, this award can help to attract top scientists from around the world into the NACRW community.
Purpose: To recognize scientists who have made impactful contributions relevant to chemical residue analysis.
Eligibility: NACRW Excellence Awards are given to scientists responsible for important contributions to chemical residue analysis. Contributions can be in the form of lifetime achievement, specific technique or methodology development or impact of research findings.
The Award: The award will consist of the following:
Awardee Selection: The NACRW Excellence Awards committee is responsible for selection of the 1st, 2nd, and 3rd candidates for the Award from all those nominated. The final choice will be made by the NACRW Board from the three candidates selected by the Awards committee.
Submit your nomination:
The nomination process simply entails the nominator(s) to list the name of the nominee(s) with a bullet point description of the main accomplishment(s) and/or justification(s) for the award in accordance with the selection criteria and then email the nomination to Teri Besse (Teri@nacrw.org) or Brad Barrett (Brad_Barrett@leco.com).
Dr. Michelangelo Anastassiades, CVUA-Stuttgart, Germany
Dr. Steven J. Lehotay, USDA-ARS, Wyndmoor, PA, USA
Dr. André de Kok, NVWA, Wageningen, The Netherlands
Dr. Harold McNair, Department of Chemistry, Virginia Tech, Blacksburg VA
Dr. Janusz Pawliszyn, Canada Research Chair, Department of Chemistry, University of Waterloo,
Waterloo, Ontario, Canada
Bob Finnigan and Michael Story